- #4,172,004, 10/23/1979Alcorn developed a method for forming dense dry etched multi-level metallurgy with non-overlapped vias.
- #4,201,800, 5/6/1980Alcorn also created a hardened photoresist master image mask process.
- #4,289,834, 9/15/1981Alcorn is responsible for developing a dense dry etched multi-level metallurgy with non-overlapped vias.
- #4,472,728, 9/18/1984In this patent, Alcorn created an imaging X-ray spectrometer.
- #4,543,442, 9/24/1985Alcorn developed the GaAs Schottky barrier photo-responsive device and method of fabrication.
- #4,618,380, 10/21/1986
Another patent by Alcorn included the method of fabricating an imaging X-ray spectrometer.
George Edward Alcorn
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